SAE AMS5843 Cobalt-Nickel Alloy, Corrosion and Heat-Resistant, Bars, 19Cr - 36Co - 25Ni - 7.0Mo - 0.50Cb (Nb) - 2.9Ti -
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来源:标准资料网
Product Code:SAE AMS5843
Title:Cobalt-Nickel Alloy, Corrosion and Heat-Resistant, Bars, 19Cr - 36Co - 25Ni - 7.0Mo - 0.50Cb (Nb) - 2.9Ti - 0.20Al - 9.0Fe, Vacuum Induction Plus Vacuum Consumable Electrode Melted, Solution Heat Treated Work Strengthened and Aged
Issuing Committee:Ams F Corrosion Heat Resistant Alloys Committee
Scope:This specification covers a high strength, corrosion and heat resistant cobalt-chromium-nickel alloy in the form of bars.
【英文标准名称】:TestMethodforQuantifyingTungstenSilicideSemiconductorProcessFilmsforCompositionandThickness
【原文标准名称】:定量分析硅化钨半导体加工膜组分和厚度的标准试验方法
【标准号】:ASTMF1894-1998(2003)
【标准状态】:现行
【国别】:
【发布日期】:1998
【实施或试行日期】:
【发布单位】:美国材料与试验协会(US-ASTM)
【起草单位】:F01.17
【标准类型】:(TestMethod)
【标准水平】:()
【中文主题词】:定量分析;硅化钨分析;背散射分析;金属膜;组分
【英文主题词】:analysisoftungstensilicide;backscatteringanalysis;composition;metallizationfilms;quantitativeanalysis;RBS;Wsix
【摘要】:ThistestmethodcanbeusedtoensureabsolutereproducibilityofWSixfilmdepositionsystemsoverthecourseofmanymonths.Thetimespanofmeasurementsisessentiallythelifeofmanyprocessdepositionsystems.ThistestmethodcanbeusedtoqualifynewWSixdepositionsystemstoensureduplicabilityofexistingsystems.Thistestmethodisessentialforthecoordinationofglobalsemiconductorfabricationoperationsusingdifferentanalyticalservices.Thistestmethodallowssamplesfromvariousdepositionsystemstobeanalyzedatdifferentsitesandtimes.Thistestmethodisthechosencalibrationtechniqueforavarietyofanalyticaltechniques,including,butnotlimitedto:5.3.1Electronspectroscopyforchemicalanalysis(ESCAorXPS),5.3.2Augerelectronspectroscopy(AES),5.3.3Fouriertransforminfraredredspectroscopy(FTIR),5.3.4Secondaryionmassspectrometry(SIMS),and5.3.5Electrondispersivespectrometry(EDS)andparticleinducedx-rayemission(PIXE).1.1Thistestmethodcoversthequantitativedeterminationoftungstenandsiliconconcentrationsintungsten/silicon(WSIx),semiconductorprocessfilmsusingRutherfordBackscatteringSpectrometry(RBS).(1)ThistestmethodalsocoversthedetectionandquantificationofimpuritiesinthemassrangefromphosphorusA(31atomicmassunits(amu)toantimony(122amu).1.2Thistestmethodcanbeusedfortungstensilicidefilmspreparedbyanydepositionorannealingprocesses,orboth.Thefilmmustbeauniformfilmwithanarealcoveragegreaterthantheincidentionbeam(~2.5mm).1.3Thistestmethodaccuratelymeasureshefollowingfilmproperties:silicon/tungstenratioandvariationswithdepth,tungstendepthprofilethroughoutfilm,WSIx,filmthickness,argonconcentrations(ifpresent),presenceofoxideonsurfaceofWSIxfilms,andtransitionmetalimpuritiestodetectionlimitsof1x1014atoms/cm2.1.4Thistestmethodcandetectabsolutedifferencesinsiliconandtungstenconcentrationsof+/-3and+/-1atomicpercent,respectively,measuredfromdifferentsamplesinseparateanalyses.relativevariationsinthetungstenconcentrationindepthcanbedetectedto+/-0.2atomicpercentwithadepthresolutionof+/-70A.1.5ThistestmethodsupportsandassistsinqualifyingWSIxfilmsbyelectricalresistivitytechniques.1.6ThistestmethodcanbeperformedforWSIxfilmsdepositedonconductingorinsulatingsubstrates.1.7ThistestmethodisusefulforWSIxfilmsbetween20and400mmwithanarealcoverageofgreaterthan1by1mm.1.8Thistestmethodisnon-destructivetothefilmtotheextentofsputtering.1.9Astatisticalprocesscontrol(SPC)ofWSIxfilmshasbeenmonitoredsince1993withreproducibilityto+/-4%.1.10ThistestmethodproducesaccuratefilmthicknessesbymodelingthefilmdensityoftheWSIxfilmasWSI2(hexagonal)plusexcesselementalSI2.Themeasuredfilmthicknessisalowerlimittotheactualfilmthicknesswithanaccuracylessthan10%comparedtoSEMcross-sectionmeasurements(see13.4)1.11Thistestmethodcanbeusedtoanalyzefilmsonwholewafersupto300mmwithoutbreakingthewafers.Thesitesthatcanbeanalyzedmayberestrictedtoconcentricringsnearthewaferedgesfor200-mmand300-mmwafers,dependingonsystemcapabilities.1.12Thisstandarddoesnotpurporttoaddressallofthesafetyconcerns,ifany,associatedwithitsuse.Itistheresponsibilityoftheuserofthisstandardtoestablishappropriatesafetyandhealthpracticesanddeterminetheapplicabilityofregulatorylimitationspriortouse.ThereaderisreferencedtoSection8ofthistestmethod......
【中国标准分类号】:H82
【国际标准分类号】:29_045
【页数】:7P.;A4
【正文语种】:
【英文标准名称】:StandardSpecificationforNickel-Iron-Chromium-Molybdenum-CopperAlloy(UNSN08825andN08221)*SeamlessPipeandTube
【原文标准名称】:镍铁铬钼铜合金无缝管标准规范
【标准号】:ASTMB423-1999
【标准状态】:作废
【国别】:美国
【发布日期】:1999
【实施或试行日期】:
【发布单位】:美国材料与试验协会(ASTM)
【起草单位】:ASTM
【标准类型】:()
【标准水平】:()
【中文主题词】:无缝管;镍;钼;铁;铜;铬;管;合金
【英文主题词】:seamlesspipes;iron;pipes;alloys;chromium;copper;molybdenum;nickel
【摘要】:
【中国标准分类号】:H62
【国际标准分类号】:23_040_15
【页数】:4P;A4
【正文语种】:英语
